Extreme_ultraviolet_lithography_tool.jpg

Description
English: EUVL tool, that deposits virtually defect-free, ultra-thin films on integrated circuits.
Date
Source Laser Programs, the first 25 years, 1972-1997 , available from osti.gov .
Author Lawrence Livermore National Laboratory
Permission
( Reusing this file )
Public domain This image is a work of a United States Department of Energy (or predecessor organization) employee, taken or made as part of that person's official duties. As a work of the U.S. federal government , the image is in the public domain .

Please note that national laboratories operate under varying licences and some are not free . Check the site policies of any national lab before crediting it with this tag.

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inception

4 March 1998