Tetrakis(trimethylsilyloxy)silane

Tetrakis(trimethylsilyloxy)silane
Names
	Preferred IUPAC name Tetrakis(trimethylsilyl) silicate
Identifiers
CAS Number	3555-47-3 ;
3D model (JSmol)	Interactive image;
Abbreviations	TTMS
ChemSpider	18019;
EC Number	222-613-4;
PubChem CID	19086;
UNII	55L9T9A11I ;
CompTox Dashboard (EPA)	DTXSID9042463;
	InChI InChI=1S/C12H36O4Si5/c1-17(2,3)13-21(14-18(4,5)6,15-19(7,8)9)16-20(10,11)12/h1-12H3 Key: VNRWTCZXQWOWIG-UHFFFAOYSA-N;
	SMILES C[Si](C)(C)O[Si](O[Si](C)(C)C)(O[Si](C)(C)C)O[Si](C)(C)C;
Properties
Chemical formula	C12H36O4Si5
Molar mass	384.841 g·mol−1
Appearance	Colourless liquid
Density	0.87 g cm−3
Melting point	−60 °C (−76 °F; 213 K)
Boiling point	103–106 °C (217–223 °F; 376–379 K)
Vapor pressure	8.96 Pa (25°C)
Refractive index (nD)	1.389
Hazards
	GHS labelling:
Pictograms
Signal word	Warning
Hazard statements	H315, H319, H335, H413
Precautionary statements	P261, P264, P271, P273, P280, P302+P352, P304+P340, P305+P351+P338, P312, P321, P332+P313, P337+P313, P362, P403+P233, P405, P501
Flash point	80 °C (176 °F; 353 K)
Related compounds
Related compounds	Hexamethyldisiloxane Octamethylcyclotetrasiloxane
	Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa). verify (what is ?) Infobox references

Chemical compound

Tetrakis(trimethylsilyloxy)silane (TTMS) is an organosilicon compound with the formula Si[OSi(CH₃)₃]₄. This colourless liquid is used as a reagent in organic synthesis.^[2]

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This article uses material from the Wikipedia article Tetrakis(trimethylsilyloxy)silane, and is written by contributors. Text is available under a CC BY-SA 4.0 International License; additional terms may apply. Images, videos and audio are available under their respective licenses.

[1] [1]
"TETRAKIS(TRIMETHYLSILOXY)SILANE - 3555-47-3".

[ChemSynthesis-2] [2]
Fleming, I (2002). Science of Synthesis: Houben-Weyl Methods of Molecular Transformations. Stuttgart: Georg Thieme Verlag. p. 1060. ISBN 3-13-112171-8.

[TTMSnano-3] [3]
Schäfer, J; Hnilica, J; Sperka, J; Quade, A; Kudrle, V; Foest, R; Vodak, J; Zajickova, L (2016). "Tetrakis(trimethylsilyloxy)silane for nanostructured SiO2-like films deposited by PECVD at atmospheric pressure". Surface & Coatings Technology. 295 (295): 112–118. doi:10.1016/j.surfcoat.2015.09.047.

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Tetrakis(trimethylsilyloxy)silane

Tetrakis(trimethylsilyloxy)silane

Application

References

External links

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